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Product Details:
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| Highlight: | 1.5 nm Filtration Ultra-High Purity Filter Cartridge,High-Purity UPE/HDPE Media Semiconductor Filter Cartridge,Low Extractables UPE/HDPE Filter Cartridge |
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PULLNER UPE / HDPE filter cartridges are developed for ultra-high purity filtration in semiconductor manufacturing and advanced microelectronics processes, where even nanoscale particles can lead to wafer defects, process instability, and costly product losses.
Designed for critical liquid and gas filtration applications, the filter series offers filtration ratings down to 1.5 nm, supporting demanding contamination control requirements in advanced semiconductor production.
The high-purity polyethylene filtration media provides excellent chemical compatibility, low particle shedding, and controlled extractables, helping minimize the risk of introducing additional contaminants into sensitive process streams.
Unlike conventional industrial filter cartridges, semiconductor-grade filtration requires more than particle removal. Material cleanliness, chemical compatibility, particle release, and consistent filtration performance are equally important.
PULLNER focuses on these critical requirements to help semiconductor manufacturers maintain process cleanliness, reduce defect-related losses, and achieve stable production performance.
Ultra-Fine Filtration Down to 1.5 nm – Designed for demanding nanoscale contamination control in semiconductor liquid and gas processes, helping reduce particle-related defects.
High-Purity UPE / HDPE Media – Polyethylene-based filtration materials provide chemical compatibility and controlled contamination characteristics for sensitive manufacturing processes.
Low Extractables & Particle Shedding – Designed to minimize contamination introduced by the filter itself, helping protect high-purity chemicals and critical process fluids.
Excellent Chemical Compatibility – Suitable for selected semiconductor chemicals, organic solvents, and process liquids, subject to chemical compatibility verification.
Stable Filtration Performance – Consistent filtration characteristics help maintain process stability and reduce unexpected quality variations.
Optimized Flow & Pressure Drop – Filter construction can be selected to balance fine particle retention, flow capacity, and pressure requirements.
Clean Manufacturing Environment – Produced under controlled cleanroom conditions to reduce the risk of contamination during filter manufacturing and assembly.
Customized Filtration Solutions – Filtration rating, cartridge dimensions, connection type, and material configuration can be selected according to specific semiconductor processes.
Used in semiconductor wet processing to reduce particulate contamination in compatible chemical solutions during wafer cleaning, surface treatment, and other critical manufacturing steps.
Even small particles introduced during wet processing may cause surface defects or interfere with subsequent manufacturing operations.
Designed for high-purity filtration requirements in photoresist-related chemical handling and compatible lithography process liquids.
The filtration system helps control fine particles and process-related contaminants that may contribute to coating defects, pattern irregularities, and reduced wafer yield.
Suitable for filtration of compatible electronic-grade solvents used in semiconductor chemical preparation, distribution, and cleaning processes.
High-purity filtration helps maintain chemical cleanliness during storage, transfer, and point-of-use operations.
Can be configured for high-purity water filtration applications where suitable membrane wettability, cleanliness, and filtration performance are required.
Typical installation points include polishing filtration, distribution systems, and critical point-of-use applications.
Dedicated gas-compatible configurations can support fine particle control in selected high-purity gas distribution and point-of-use applications.
Material compatibility, gas cleanliness, flow conditions, and pressure requirements must be confirmed for each process.
Suitable for contamination-sensitive processes in advanced packaging, integrated circuit manufacturing, electronic chemicals, and other microelectronics applications requiring high-purity filtration.
In advanced semiconductor manufacturing, contamination is not limited to visible particles or conventional micron-sized impurities.
Extremely small particles and material-derived contaminants can interfere with sensitive wafer processing steps, potentially contributing to surface defects, process instability, and yield losses.
Conventional industrial filtration products may not provide the cleanliness characteristics required for these applications.
PULLNER UPE / HDPE filters focus on three critical aspects of semiconductor contamination control:
Particle Retention – Reducing fine particulate contamination before it reaches sensitive manufacturing processes.
Material Cleanliness – Minimizing particle release and extractables from filter materials.
Process Compatibility – Matching the filtration media and cartridge construction to the specific chemical, gas, temperature, and operating conditions.
The objective is not simply to achieve a finer filtration rating, but to help maintain the cleanliness and consistency of the entire process stream.
PULLNER offers UPE / HDPE filtration solutions for high-purity liquid processing with filtration ratings down to 1.5 nm.
Applications include selected semiconductor chemicals, high-purity solvents, wet-processing fluids, and compatible electronic-grade liquids.
Cartridge selection considers liquid chemistry, filtration efficiency, cleanliness requirements, flow rate, and operating pressure.
PULLNER also offers filtration solutions for semiconductor process gases, with specified ratings down to 1.5 nm.
Gas filtration configurations are selected according to particle retention requirements, gas compatibility, operating pressure, flow rate, and installation conditions.
Liquid and gas filter designs are evaluated separately to ensure suitability for their intended operating environments.
| Parameter | Specification |
|---|---|
| Product Name | UPE / HDPE Ultra-High Purity Filter Cartridge |
| Brand | PULLNER |
| Filter Media | UPE / HDPE |
| Minimum Filtration Rating | Down to 1.5 nm |
| Filtration Application | High-Purity Liquid / Gas |
| Main Industry | Semiconductor / Microelectronics |
| Cartridge Construction | Application-Specific |
| Filtration Efficiency | According to Selected Rating and Test Conditions |
| Chemical Compatibility | According to Process Fluid |
| Operating Temperature | Depending on Material and Application |
| Operating Pressure | According to Cartridge Design |
| Flow Rate | Application-Dependent |
| Connection Type | Customized |
| Primary Function | Nanoscale Particle Contamination Control |
| Customization | Filtration Rating / Dimensions / Connections / Configuration |
Q1: What are UPE and HDPE filter cartridges used for in semiconductor manufacturing?
They are used for high-purity filtration where particle contamination must be strictly controlled. Typical applications include semiconductor wet chemicals, electronic-grade solvents, lithography-related fluids, ultrapure water, and selected process gas applications.
Q2: What is the minimum filtration rating available?
PULLNER offers filtration solutions with specified ratings down to 1.5 nm for liquid and gas applications. Filtration efficiency, particle retention performance, and applicable test methods should be confirmed for the selected product configuration.
Q3: Why choose UPE or HDPE instead of conventional filter materials?
Polyethylene-based filtration materials can provide suitable chemical compatibility and controlled cleanliness characteristics for selected semiconductor processes. Material selection depends on chemical exposure, particle retention requirements, extractables, and operating conditions.
Q4: Can these filters be used for photoresist filtration?
Potentially, depending on the photoresist formulation, solvent composition, required particle retention, and membrane compatibility. Product-specific evaluation is recommended before use in critical lithography applications.
Q5: Are UPE / HDPE filters suitable for aggressive semiconductor chemicals?
Compatibility depends on chemical composition, concentration, temperature, and exposure time. Each application should be evaluated individually rather than assuming universal chemical resistance.
Q6: Can the same cartridge be used for both liquid and gas filtration?
Not necessarily. Liquid and gas filtration have different performance and testing requirements. Dedicated cartridge configurations should be selected according to the intended application.
Q7: How can filtration performance be verified?
Depending on the product and application, evaluation may include particle retention testing, pressure drop measurement, extractables analysis, particle shedding assessment, and chemical compatibility testing. Test documentation and acceptance criteria should be confirmed during technical review.
Q8: Can PULLNER supply customized semiconductor filter cartridges?
Yes. Filter media, filtration rating, cartridge dimensions, connections, and other structural details can be discussed according to process requirements and equipment compatibility.
Looking for ultra-high purity filtration down to 1.5 nm?
PULLNER provides UPE / HDPE filtration solutions for semiconductor manufacturers, electronic chemical suppliers, and advanced microelectronics production facilities.
Whether the requirement involves nanoscale particle control, high-purity chemical filtration, or gas filtration, we can help evaluate a suitable filter configuration based on the actual process conditions.
Share your process liquid or gas, required filtration rating, flow rate, operating pressure, temperature, and existing filter model or drawing for technical evaluation and quotation.
PULLNER – High-Purity Filtration Solutions for Semiconductor Manufacturing
We provide comprehensive technical support for installation, operation, and maintenance, including filter replacement guidance and maintenance recommendations. Complete documentation includes user manuals, installation guides, and troubleshooting notes.
Shanghai Pullner Filtration Technology Co., Ltd. was established in May 2011 with a registered capital of RMB 26 million. The company operates a Class 100,000 cleanroom workshop (3,000 m²) and an on-site Class 1,000 clean laboratory, integrating R&D, manufacturing, and sales of microporous membrane filtration equipment and filtration systems.
Pullner products are widely applied in microelectronics, fine chemicals, new energy, seawater desalination, biotech, and laboratory fields, including LCD panels, semiconductor processing, high-purity chemicals, condensate filtration, and reclaimed water reuse.
The company holds ISO9001 / ISO14001 / ISO45001 certificates, is recognized as a high-tech enterprise, and owns multiple patents. Pullner is also an approved vendor of Saudi Aramco.
Contact Person: Hudarm
Tel: 86-18311506837
Fax: 86-021-57711314