20-inch Ultra-High Purity Filter Cartridge with 1.5 nm Filtration for G4 Semiconductor Photoresist

Product Description

The PULLNER 20-inch UPE / HDPE filter cartridge is designed for ultra-high purity liquid filtration in semiconductor manufacturing, particularly for G4-grade photoresist production, electronic chemical purification, and critical point-of-use filtration.

Featuring high-purity polyethylene filtration media and a 226 O-ring + Flat end cap configuration, the cartridge combines nanoscale particle control with practical compatibility for existing semiconductor filtration equipment. Selected filtration configurations are available with ratings down to 1.5 nm, subject to application-specific performance verification.

In advanced semiconductor manufacturing, even trace particles and gel contaminants in photoresist can contribute to coating defects, pattern irregularities, and reduced wafer yield. The PULLNER UPE / HDPE cartridge is designed to address these challenges by controlling particulate contamination while minimizing contamination introduced by the filtration media itself.

Unlike standard industrial cartridges, this product focuses on three critical semiconductor requirements: ultra-fine particle retention, high material cleanliness, and consistent filtration performance.

Application-Focused Design

For G4-grade photoresist filtration applications, PULLNER offers a 20-inch UPE / HDPE cartridge with a 226 + Flat connection, providing a practical solution for high-purity chemical production and filtration equipment replacement.

The polyethylene filtration media is selected to help remove fine particles and gel-related contaminants from compatible photoresist formulations. The cartridge structure is designed to support stable flow while maintaining the required particle retention performance.

The 20-inch format provides a larger filtration area than shorter cartridges of equivalent construction, while the 226 + Flat design enables installation in compatible existing filter housings.

This configuration is particularly relevant for semiconductor chemical suppliers and manufacturers seeking to upgrade filtration performance without replacing the entire filtration system.

Key Features & Customer Benefits

• Ultra-Fine Filtration Down to 1.5 nm – Selected configurations support demanding nanoscale particle control requirements in high-purity semiconductor liquid processing.

• High-Purity UPE / HDPE Media – Designed for sensitive electronic chemical applications where filter cleanliness, particle release, and material compatibility are critical.

• Optimized for Photoresist Filtration – Helps control fine particles and gel contaminants that may contribute to coating defects and lithography process instability.

• 20-Inch Filtration Configuration – Provides increased filtration area for chemical transfer, production filtration, and point-of-use installations.

• 226 O-Ring + Flat End Cap – Supports direct replacement in compatible filtration housings, reducing equipment modification and installation costs.

• Low-Contamination Design – Material selection and cartridge construction focus on minimizing particle shedding and extractables in high-purity process liquids.

• Stable Flow Performance – Filtration media and cartridge configuration can be selected to balance particle retention, flow rate, and pressure drop.

• Customized Semiconductor Filtration Solutions – Cartridge length, end connection, filtration rating, and material configuration can be matched to specific chemical processes.

Target Applications

G4-Grade Photoresist Production – Fine particle and gel contamination control during photoresist manufacturing, transfer, and final filtration.

Semiconductor Lithography Processes – Point-of-use filtration of compatible lithography chemicals to help reduce particle-related process defects.

Electronic-Grade Chemical Purification – Filtration of compatible high-purity solvents and chemical solutions used in semiconductor production.

Chemical Storage & Distribution – Particle control during transfer between chemical storage tanks, production equipment, and distribution systems.

Replacement for Existing Semiconductor Filters – Customized cartridge configurations for customers requiring compatible replacement elements for existing filtration housings.

Technical Specifications

A Practical Solution for Semiconductor Chemical Manufacturers

For manufacturers pursuing G4-grade electronic chemical processing, conventional filtration products may not provide the required combination of nanoscale particle retention, material cleanliness, and process compatibility.

The PULLNER 20-inch UPE / HDPE cartridge offers an application-focused filtration option for sensitive photoresist processing. Its high-purity media, fine filtration capability, and familiar 226 + Flat configuration help address both contamination-control requirements and existing equipment compatibility.

Beyond particle removal, the objective is to support consistent chemical quality, reduce filtration-related contamination risks, and improve reliability across semiconductor production processes.

Custom Filtration Solutions from PULLNER

Need a high-purity replacement filter for semiconductor photoresist or electronic chemicals?

PULLNER provides customized UPE / HDPE filter cartridges for semiconductor chemical manufacturers, material suppliers, and filtration equipment distributors.

Whether you are replacing an existing 20-inch 226 + Flat cartridge or evaluating a finer filtration solution for a new production line, PULLNER can help review media compatibility, filtration requirements, cartridge dimensions, and operating conditions.

Send us your existing filter model, required filtration rating, chemical type, flow rate, and operating conditions for product selection and quotation.

PULLNER | Ultra-High Purity Filtration for Semiconductor Manufacturing

www.pullnerfilter.com

We provide comprehensive technical support for installation, operation, and maintenance, including filter replacement guidance and maintenance recommendations. Complete documentation includes user manuals, installation guides, and troubleshooting notes.

Shanghai Pullner Filtration Technology Co., Ltd. was established in May 2011 with a registered capital of RMB 26 million. The company operates a Class 100,000 cleanroom workshop (3,000 m²) and an on-site Class 1,000 clean laboratory, integrating R&D, manufacturing, and sales of microporous membrane filtration equipment and filtration systems.

Pullner products are widely applied in microelectronics, fine chemicals, new energy, seawater desalination, biotech, and laboratory fields, including LCD panels, semiconductor processing, high-purity chemicals, condensate filtration, and reclaimed water reuse.

The company holds ISO9001 / ISO14001 / ISO45001 certificates, is recognized as a high-tech enterprise, and owns multiple patents. Pullner is also an approved vendor of Saudi Aramco.